Atmospheric pressure atomic layer deposition of Al₂O₃ using trimethyl aluminum and ozone.
about
Atomic and molecular layer deposition: off the beaten track.Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions.Atmospheric pressure synthesis of photoluminescent hybrid materials by sequential organometallic vapor infiltration into polyethylene terephthalate fibers
P2860
Atmospheric pressure atomic layer deposition of Al₂O₃ using trimethyl aluminum and ozone.
description
2014 nî lūn-bûn
@nan
2014 թուականի Մարտին հրատարակուած գիտական յօդուած
@hyw
2014 թվականի մարտին հրատարակված գիտական հոդված
@hy
2014年の論文
@ja
2014年論文
@yue
2014年論文
@zh-hant
2014年論文
@zh-hk
2014年論文
@zh-mo
2014年論文
@zh-tw
2014年论文
@wuu
name
Atmospheric pressure atomic layer deposition of Al₂O₃ using trimethyl aluminum and ozone.
@ast
Atmospheric pressure atomic layer deposition of Al₂O₃ using trimethyl aluminum and ozone.
@en
type
label
Atmospheric pressure atomic layer deposition of Al₂O₃ using trimethyl aluminum and ozone.
@ast
Atmospheric pressure atomic layer deposition of Al₂O₃ using trimethyl aluminum and ozone.
@en
prefLabel
Atmospheric pressure atomic layer deposition of Al₂O₃ using trimethyl aluminum and ozone.
@ast
Atmospheric pressure atomic layer deposition of Al₂O₃ using trimethyl aluminum and ozone.
@en
P356
P1433
P1476
Atmospheric pressure atomic layer deposition of Al₂O₃ using trimethyl aluminum and ozone.
@en
P2093
Christopher J Oldham
Moataz Bellah M Mousa
P304
P356
10.1021/LA500796R
P407
P577
2014-03-25T00:00:00Z