Resolution limits of electron-beam lithography toward the atomic scale.
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Quantum mechanical effects in plasmonic structures with subnanometre gapsManual, In situ, Real-Time Nanofabrication using Cracking through Indentation.Size-dependent redox behavior of iron observed by in-situ single nanoparticle spectro-microscopy on well-defined model systemsRobust rotation of rotor in a thermally driven nanomotorAtmospheric pressure PECVD nanoparticles: mechanism of nanoparticle self-organisation into micron sized fractal clusters on a solid surface.Metallic resist for phase-change lithography.Nano-artifact metrics based on random collapse of resistA study on one-step laser nanopatterning onto copper-hydrazone-complex thin films and its mechanism.Multiscale conformal pattern transferNovel Self-shrinking Mask for Sub-3 nm Pattern FabricationCracking-assisted fabrication of nanoscale patterns for micro/nanotechnological applications.Catalyst support effects on hydrogen spillover.Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond.Quantum mechanical limit to plasmonic enhancement as observed by surface-enhanced Raman scattering.Fabrication of nanochannels on polystyrene surfaceProgrammable definition of nanogap electronic devices using self-inhibited reagent depletionArbitrary Shape Engineerable Spiral Micropseudocapacitors with Ultrahigh Energy and Power Densities.Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al2O3 and its application in imprinting lithography.Sub-10 Nanometer Feature Size in Silicon Using Thermal Scanning Probe Lithography.Patterned Plasmonic Surfaces-Theory, Fabrication, and Applications in Biosensing.Integrating Sub-3 nm Plasmonic Gaps into Solid-State Nanopores.The Orientations of Large Aspect-Ratio Coiled-Coil Proteins Attached to Gold Nanostructures.Scalable Solution-processed Fabrication Strategy for High-performance, Flexible, Transparent Electrodes with Embedded Metal Mesh.Sub-100 nm wrinkling of polydimethylsiloxane by double frontal oxidation.Enhancing Near-Field Radiative Heat Transfer with Si-based Metasurfaces.Toward Scalable Flexible Nanomanufacturing for Photonic Structures and Devices.Fabrication of Nanopillar-Based Split Ring Resonators for Displacement Current Mediated Resonances in Terahertz Metamaterials.Self-folding nanostructures with imprint patterned surfaces (SNIPS).Nanoscale Electrodes for Flexible Electronics by Swelling Controlled Cracking.Molecular protein adaptor with genetically encoded interaction sites guiding the hierarchical assembly of plasmonically active nanoparticle architectures.Dispersion engineering for vertical microcavities using subwavelength gratings.Design rules for self-assembled block copolymer patterns using tiled templates.Selective functionalization of patterned glass surfacesFabrication of Polymer Microstructures of Various Angles via Synchrotron X-Ray Lithography Using Simple Dimensional TransformationHybrid Materials for Integrated Photonics
P2860
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P2860
Resolution limits of electron-beam lithography toward the atomic scale.
description
2013 nî lūn-bûn
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2013 թուականի Մարտին հրատարակուած գիտական յօդուած
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2013 թվականի մարտին հրատարակված գիտական հոդված
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2013年の論文
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2013年論文
@yue
2013年論文
@zh-hant
2013年論文
@zh-hk
2013年論文
@zh-mo
2013年論文
@zh-tw
2013年论文
@wuu
name
Resolution limits of electron-beam lithography toward the atomic scale.
@ast
Resolution limits of electron-beam lithography toward the atomic scale.
@en
Resolution limits of electron-beam lithography toward the atomic scale.
@nl
type
label
Resolution limits of electron-beam lithography toward the atomic scale.
@ast
Resolution limits of electron-beam lithography toward the atomic scale.
@en
Resolution limits of electron-beam lithography toward the atomic scale.
@nl
prefLabel
Resolution limits of electron-beam lithography toward the atomic scale.
@ast
Resolution limits of electron-beam lithography toward the atomic scale.
@en
Resolution limits of electron-beam lithography toward the atomic scale.
@nl
P2093
P356
P1433
P1476
Resolution limits of electron-beam lithography toward the atomic scale
@en
P2093
Eric A Stach
Huigao Duan
Karl K Berggren
Lihua Zhang
Richard G Hobbs
Vitor R Manfrinato
P304
P356
10.1021/NL304715P
P407
P50
P577
2013-03-19T00:00:00Z