Directed block copolymer self-assembly implemented via surface-embedded electrets.

about

Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker.

P2860

Q47105403-85382C29-821D-44F9-94B1-857081EFA161

P2860

Directed block copolymer self-assembly implemented via surface-embedded electrets.

Item

http://www.wikidata.org/entity/Q36587783

description

2016 nî lūn-bûn

@nan

2016年の論文

@ja

2016年論文

@yue

2016年論文

@zh-hant

2016年論文

@zh-hk

2016年論文

@zh-mo

2016年論文

@zh-tw

2016年论文

@wuu

2016年论文

@zh

2016年论文

@zh-cn

name

Directed block copolymer self-assembly implemented via surface-embedded electrets.

@ast

Directed block copolymer self-assembly implemented via surface-embedded electrets.

@en

type

Item

label

Directed block copolymer self-assembly implemented via surface-embedded electrets.

@ast

Directed block copolymer self-assembly implemented via surface-embedded electrets.

@en

prefLabel

Directed block copolymer self-assembly implemented via surface-embedded electrets.

@ast

Directed block copolymer self-assembly implemented via surface-embedded electrets.

@en

P1476

Directed block copolymer self-assembly implemented via surface-embedded electrets

@en

P2093

Li-Jun Wan

http://www.w3.org/2001/XMLSchema#string

Mei-Ling Wu

http://www.w3.org/2001/XMLSchema#string

P2860

Arbitrary lattice symmetries via block copolymer nanomeshes

Unidirectionally aligned line patterns driven by entropic effects on faceted surfaces

Block copolymer nanolithography: translation of molecular level control to nanoscale patterns.

Efficient photon management with nanostructures for photovoltaics.

Directed self-assembly of block copolymers: a tutorial review of strategies for enabling nanotechnology with soft matter.

Submicrometer patterning of charge in thin-film electrets.

Pattern placement accuracy in block copolymer directed self-assembly based on chemical epitaxy.

Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio.

Evolution of block copolymer lithography to highly ordered square arrays.

Enabling complex nanoscale pattern customization using directed self-assembly.

P2888

ncomms10752

P304

10752

http://www.w3.org/2001/XMLSchema#string

P31

scholarly article

P356

10.1038/NCOMMS10752

http://www.w3.org/2001/XMLSchema#string

P407

English

P478

http://www.w3.org/2001/XMLSchema#string

P50

Dong Wang

P577

2016-02-15T00:00:00Z

http://www.w3.org/2001/XMLSchema#dateTime

P5875

294731100

http://www.w3.org/2001/XMLSchema#string

P698

26876792

http://www.w3.org/2001/XMLSchema#string

P921

self-assembly

P932

4756386

http://www.w3.org/2001/XMLSchema#string

Directed block copolymer self-assembly implemented via surface-embedded electrets.

about

P2860

P2860

Directed block copolymer self-assembly implemented via surface-embedded electrets.

description

name

type

label

prefLabel

P1433

P1476

P2093

P2860

P2888

P304

P31

P356

P407

P478

P50

P577

P5875

P698

P921

P932

P356

P1433

P1476

P2093

P2860

P2888

P304

P31

P356

P407

P478

P50

P577

P5875

P698

P921

P932