Enabling complex nanoscale pattern customization using directed self-assembly.
about
Nanoscale chemical imaging by photoinduced force microscopySelective directed self-assembly of coexisting morphologies using block copolymer blendsMultilayer block copolymer meshes by orthogonal self-assemblyDirected block copolymer self-assembly implemented via surface-embedded electrets.A Novel Nanofabrication Technique of Silicon-Based Nanostructures.
P2860
Enabling complex nanoscale pattern customization using directed self-assembly.
description
2014 nî lūn-bûn
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2014年の論文
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2014年学术文章
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2014年学术文章
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name
Enabling complex nanoscale pattern customization using directed self-assembly.
@en
Enabling complex nanoscale pattern customization using directed self-assembly.
@nl
type
label
Enabling complex nanoscale pattern customization using directed self-assembly.
@en
Enabling complex nanoscale pattern customization using directed self-assembly.
@nl
prefLabel
Enabling complex nanoscale pattern customization using directed self-assembly.
@en
Enabling complex nanoscale pattern customization using directed self-assembly.
@nl
P2093
P2860
P356
P1476
Enabling complex nanoscale pattern customization using directed self-assembly.
@en
P2093
Charles T Rettner
Daniel P Sanders
Gregory S Doerk
Gurpreet Singh
Jed W Pitera
Joy Y Cheng
Noel Arellano
Srinivasan Balakrishnan
P2860
P2888
P356
10.1038/NCOMMS6805
P407
P577
2014-12-16T00:00:00Z