Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates.
about
Well-ordered self-assembled nanostructures of block copolymer films via synergistic integration of chemoepitaxy and zone annealing.Ordering kinetics of lamella-forming block copolymers under the guidance of various external fields studied by dynamic self-consistent field theory.Controlled Segmentation of Metal Nanowire Array by Block Copolymer Lithography and Reversible Ion Loading.Interconnected ionic domains enhance conductivity in microphase separated block copolymer electrolytes
P2860
Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates.
description
2016 nî lūn-bûn
@nan
2016年の論文
@ja
2016年論文
@yue
2016年論文
@zh-hant
2016年論文
@zh-hk
2016年論文
@zh-mo
2016年論文
@zh-tw
2016年论文
@wuu
2016年论文
@zh
2016年论文
@zh-cn
name
Directed self-assembly of solv ...... s on nanopatterned substrates.
@en
type
label
Directed self-assembly of solv ...... s on nanopatterned substrates.
@en
prefLabel
Directed self-assembly of solv ...... s on nanopatterned substrates.
@en
P2093
P2860
P356
P1433
P1476
Directed self-assembly of solv ...... s on nanopatterned substrates.
@en
P2093
Chi-Chun Liu
Gordon S W Craig
Paul F Nealey
Shengxiang Ji
P2860
P304
P356
10.1039/C5SM02829A
P577
2016-02-18T00:00:00Z