Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching.
about
Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching.
description
2013 nî lūn-bûn
@nan
2013年の論文
@ja
2013年論文
@yue
2013年論文
@zh-hant
2013年論文
@zh-hk
2013年論文
@zh-mo
2013年論文
@zh-tw
2013年论文
@wuu
2013年论文
@zh
2013年论文
@zh-cn
name
Novel hybrid organic-inorganic ...... ing resistance to dry etching.
@en
type
label
Novel hybrid organic-inorganic ...... ing resistance to dry etching.
@en
prefLabel
Novel hybrid organic-inorganic ...... ing resistance to dry etching.
@en
P2093
P2860
P356
P1433
P1476
Novel hybrid organic-inorganic ...... ding resistance to dry etching
@en
P2093
Alessandro Pozzato
Erika Zanchetta
Gianluca Grenci
Gioia Della Giustina
Giovanna Brusatin
P2860
P304
P356
10.1002/ADMA.201301555
P407
P577
2013-08-05T00:00:00Z