Super-selective cryogenic etching for sub-10 nm features.
about
Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond.Cryogenic Etching of High Aspect Ratio 400 nm Pitch Silicon Gratings.Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching.Surface plasmon polariton laser based on a metallic trench Fabry-Perot resonator.
P2860
Super-selective cryogenic etching for sub-10 nm features.
description
2012 nî lūn-bûn
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name
Super-selective cryogenic etching for sub-10 nm features.
@en
Super-selective cryogenic etching for sub-10 nm features.
@nl
type
label
Super-selective cryogenic etching for sub-10 nm features.
@en
Super-selective cryogenic etching for sub-10 nm features.
@nl
prefLabel
Super-selective cryogenic etching for sub-10 nm features.
@en
Super-selective cryogenic etching for sub-10 nm features.
@nl
P2093
P356
P1433
P1476
Super-selective cryogenic etching for sub-10 nm features.
@en
P2093
Bruce Harteneck
Deirdre Olynick
P304
P356
10.1088/0957-4484/24/1/015305
P577
2012-12-07T00:00:00Z