Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD.
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Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD.
description
2017 nî lūn-bûn
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2017年の論文
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2017年学术文章
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2017年学术文章
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2017年学术文章
@zh-cn
2017年学术文章
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2017年学术文章
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2017年学术文章
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2017年學術文章
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2017年學術文章
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name
Understanding inherent substra ...... echanisms during tungsten ALD.
@en
Understanding inherent substra ...... echanisms during tungsten ALD.
@nl
type
label
Understanding inherent substra ...... echanisms during tungsten ALD.
@en
Understanding inherent substra ...... echanisms during tungsten ALD.
@nl
prefLabel
Understanding inherent substra ...... echanisms during tungsten ALD.
@en
Understanding inherent substra ...... echanisms during tungsten ALD.
@nl
P2860
P356
P1476
Understanding inherent substra ...... echanisms during tungsten ALD.
@en
P2093
Mariah King
Paul C Lemaire
P2860
P304
P356
10.1063/1.4967811
P407
P577
2017-02-01T00:00:00Z