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Q44870009-0C75DD87-5A8F-4C77-A58B-557073D4F0F6
Q44870009-0C75DD87-5A8F-4C77-A58B-557073D4F0F6
BestRank
Statement
http://www.wikidata.org/entity/statement/Q44870009-0C75DD87-5A8F-4C77-A58B-557073D4F0F6
Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD.
P50
Q44870009-0C75DD87-5A8F-4C77-A58B-557073D4F0F6
BestRank
Statement
http://www.wikidata.org/entity/statement/Q44870009-0C75DD87-5A8F-4C77-A58B-557073D4F0F6
rank
NormalRank
type
BestRank
Statement
wasDerivedFrom
63fed03d79867456fc374488449ed4ba67e2195e
P1545
3
http://www.w3.org/2001/XMLSchema#string
P50
Gregory N Parsons