Electron interactions with the focused electron beam induced processing (FEBID) precursor tungsten hexachloride.
about
Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process.Interactions of low-energy electrons with the FEBID precursor chromium hexacarbonyl (Cr(CO)6).Dissociative electron attachment to coordination complexes of chromium: chromium(0) hexacarbonyl and benzene-chromium(0) tricarbonyl.
P2860
Electron interactions with the focused electron beam induced processing (FEBID) precursor tungsten hexachloride.
description
2016 nî lūn-bûn
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name
Electron interactions with the ...... ecursor tungsten hexachloride.
@en
Electron interactions with the focused electron beam induced processing
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type
label
Electron interactions with the ...... ecursor tungsten hexachloride.
@en
Electron interactions with the focused electron beam induced processing
@nl
prefLabel
Electron interactions with the ...... ecursor tungsten hexachloride.
@en
Electron interactions with the focused electron beam induced processing
@nl
P2860
P356
P1476
Electron interactions with the ...... ecursor tungsten hexachloride.
@en
P2093
Filipe Ferreira da Silva
Michael Neustetter
P2860
P304
P356
10.1002/RCM.7542
P577
2016-05-01T00:00:00Z