Dissociative electron attachment to hexafluoroacetylacetone and its bidentate metal complexes M(hfac)2; M = Cu, Pd.
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The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursorsElectron interactions with the focused electron beam induced processing (FEBID) precursor tungsten hexachloride.Dissociative electron attachment to coordination complexes of chromium: chromium(0) hexacarbonyl and benzene-chromium(0) tricarbonyl.Electron interaction with copper(II) carboxylate compounds.
P2860
Dissociative electron attachment to hexafluoroacetylacetone and its bidentate metal complexes M(hfac)2; M = Cu, Pd.
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Dissociative electron attachme ...... omplexes M(hfac)2; M = Cu, Pd.
@en
Dissociative electron attachme ...... omplexes M(hfac)2; M = Cu, Pd.
@nl
type
label
Dissociative electron attachme ...... omplexes M(hfac)2; M = Cu, Pd.
@en
Dissociative electron attachme ...... omplexes M(hfac)2; M = Cu, Pd.
@nl
prefLabel
Dissociative electron attachme ...... omplexes M(hfac)2; M = Cu, Pd.
@en
Dissociative electron attachme ...... omplexes M(hfac)2; M = Cu, Pd.
@nl
P2093
P2860
P356
P1476
Dissociative electron attachme ...... omplexes M(hfac)2; M = Cu, Pd.
@en
P2093
Benedikt Ómarsson
Michal Lacko
Michal Stano
Sarah Engmann
Štefan Matejčík
P2860
P304
P356
10.1063/1.4810877
P407
P577
2013-06-01T00:00:00Z