Three-dimensional inverse design of nanopatterns with block copolymers and homopolymers.

about

Elucidating dominant pathways of the nano-particle self-assembly process.

P2860

Q53096190-56DBF001-50F7-42C2-BC39-68A6FE079A25

P2860

Three-dimensional inverse design of nanopatterns with block copolymers and homopolymers.

Item

http://www.wikidata.org/entity/Q50880107

description

2016 nî lūn-bûn

@nan

2016年の論文

@ja

2016年学术文章

@wuu

2016年学术文章

@zh

2016年学术文章

@zh-cn

2016年学术文章

@zh-hans

2016年学术文章

@zh-my

2016年学术文章

@zh-sg

2016年學術文章

@yue

2016年學術文章

@zh-hant

name

Three-dimensional inverse design of nanopatterns with block copolymers and homopolymers.

@en

Three-dimensional inverse design of nanopatterns with block copolymers and homopolymers.

@nl

type

Item

label

Three-dimensional inverse design of nanopatterns with block copolymers and homopolymers.

@en

Three-dimensional inverse design of nanopatterns with block copolymers and homopolymers.

@nl

prefLabel

Three-dimensional inverse design of nanopatterns with block copolymers and homopolymers.

@en

Three-dimensional inverse design of nanopatterns with block copolymers and homopolymers.

@nl

P1476

Three-dimensional inverse design of nanopatterns with block copolymers and homopolymers.

@en

P2093

Dan Xu

http://www.w3.org/2001/XMLSchema#string

You-Liang Zhu

http://www.w3.org/2001/XMLSchema#string

Zhong-Yuan Lu

http://www.w3.org/2001/XMLSchema#string

P2860

Statistical Mechanics of Dissipative Particle Dynamics

Scanning probe block copolymer lithography.

Self-assembly of diblock copolymer confined in an array-structure space.

Optimizing topographical templates for directed self-assembly of block copolymers via inverse design simulations.

Patterning and templating for nanoelectronics.

Poly(3-alkylthiophene) diblock copolymers with ordered microstructures and continuous semiconducting pathways.

GALAMOST: GPU-accelerated large-scale molecular simulation toolkit.

Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.

From a two-dimensional chemical pattern to a three-dimensional topology through selective inversion of a liquid-liquid bilayer.

Thermally-induced transition of lamellae orientation in block-copolymer films on 'neutral' nanoparticle-coated substrates.

P304

5235-5244

http://www.w3.org/2001/XMLSchema#string

P31

scholarly article

P356

10.1039/C5NR07497E

http://www.w3.org/2001/XMLSchema#string

P407

English

P433

http://www.w3.org/2001/XMLSchema#string

P478

http://www.w3.org/2001/XMLSchema#string

P50

Hong Liu

P577

2016-02-16T00:00:00Z

http://www.w3.org/2001/XMLSchema#dateTime

P698

26880143

http://www.w3.org/2001/XMLSchema#string

Three-dimensional inverse design of nanopatterns with block copolymers and homopolymers.

about

P2860

P2860

Three-dimensional inverse design of nanopatterns with block copolymers and homopolymers.

description

name

type

label

prefLabel

P1433

P1476

P2093

P2860

P304

P31

P356

P407

P433

P478

P50

P577

P698

P356

P1433

P1476

P2093

P2860

P304

P31

P356

P407

P433

P478

P50

P577

P698