Hierarchical Manipulation of Block Copolymer Patterns on 3D Topographic Substrates: Beyond Graphoepitaxy.

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Bicomponent Block Copolymers Derived from One or More Random Copolymers as an Alternative Route to Controllable Phase Behavior.Micro-texture design and optimization in hydrodynamic lubrication via two-scale analysis

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P2860

Hierarchical Manipulation of Block Copolymer Patterns on 3D Topographic Substrates: Beyond Graphoepitaxy.

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http://www.wikidata.org/entity/Q54098835

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2016 nî lūn-bûn

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2016年の論文

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2016年学术文章

@wuu

2016年学术文章

@zh-cn

2016年学术文章

@zh-hans

2016年学术文章

@zh-my

2016年学术文章

@zh-sg

2016年學術文章

@yue

2016年學術文章

@zh

2016年學術文章

@zh-hant

name

Hierarchical Manipulation of B ...... strates: Beyond Graphoepitaxy.

@en

Hierarchical Manipulation of B ...... strates: Beyond Graphoepitaxy.

@nl

type

Item

label

Hierarchical Manipulation of B ...... strates: Beyond Graphoepitaxy.

@en

Hierarchical Manipulation of B ...... strates: Beyond Graphoepitaxy.

@nl

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Hierarchical Manipulation of B ...... strates: Beyond Graphoepitaxy.

@en

Hierarchical Manipulation of B ...... strates: Beyond Graphoepitaxy.

@nl

P1476

Hierarchical Manipulation of B ...... strates: Beyond Graphoepitaxy.

@en

P2093

Alexander Böker

http://www.w3.org/2001/XMLSchema#string

Xiao Cheng

http://www.w3.org/2001/XMLSchema#string

P2860

Finite deformation mechanics in buckled thin films on compliant supports.

Multilayer block copolymer meshes by orthogonal self-assembly

Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application.

Laterally Ordered Sub-10 nm Features Obtained From Directed Self-Assembly of Si-Containing Block Copolymer Thin Films.

Nanoscale block copolymer ordering induced by visible interferometric micropatterning: a route towards large scale block copolymer 2D crystals.

Characterizing the Three-Dimensional Structure of Block Copolymers via Sequential Infiltration Synthesis and Scanning Transmission Electron Tomography.

Flexible one diode-one phase change memory array enabled by block copolymer self-assembly.

Multicomponent nanopatterns by directed block copolymer self-assembly.

Patterning and templating for nanoelectronics.

Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.

P304

6900-6905

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P31

scholarly article

P356

10.1002/ADMA.201601098

http://www.w3.org/2001/XMLSchema#string

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English

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http://www.w3.org/2001/XMLSchema#string

P478

http://www.w3.org/2001/XMLSchema#string

P50

Larisa Tsarkova

Sungjune Park

P577

2016-06-06T00:00:00Z

http://www.w3.org/2001/XMLSchema#dateTime

P698

27270877

http://www.w3.org/2001/XMLSchema#string

Hierarchical Manipulation of Block Copolymer Patterns on 3D Topographic Substrates: Beyond Graphoepitaxy.

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P2860

P2860

Hierarchical Manipulation of Block Copolymer Patterns on 3D Topographic Substrates: Beyond Graphoepitaxy.

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P1433

P1476

P2093

P2860

P304

P31

P356

P407

P433

P478

P50

P577

P698

P356

P1433

P1476

P2093

P2860

P304

P31

P356

P407

P433

P478

P50

P577

P698