Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist
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Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist
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wetenschappelijk artikel
@nl
наукова стаття, опублікована в листопаді 2010
@uk
name
Sub-10-nm half-pitch electron-beam lithography by using poly
@nl
Sub-10-nm half-pitch electron- ...... acrylate) as a negative resist
@en
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label
Sub-10-nm half-pitch electron-beam lithography by using poly
@nl
Sub-10-nm half-pitch electron- ...... acrylate) as a negative resist
@en
prefLabel
Sub-10-nm half-pitch electron-beam lithography by using poly
@nl
Sub-10-nm half-pitch electron- ...... acrylate) as a negative resist
@en
P2093
P356
P1476
Sub-10-nm half-pitch electron- ...... acrylate) as a negative resist
@en
P2093
Bryan M. Cord
Donald Winston
Huigao Duan
Joel K. W. Yang
Karl K. Berggren
Vitor R. Manfrinato
P304
C6C58-C6C62
P356
10.1116/1.3501353
P577
2010-11-01T00:00:00Z