about
Precisely-controlled fabrication of single ZnO nanoemitter arrays and their possible application in low energy parallel electron beam exposure.Flexible fabrication and applications of polymer nanochannels and nanoslitsIntegrated ZnO Nano-Electron-Emitter with Self-Modulated Parasitic Tunneling Field Effect Transistor at the Surface of the p-Si/ZnO JunctionPatterning of conjugated polymers for organic optoelectronic devices.Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond.
P2860
description
wetenschappelijk artikel
@nl
наукова стаття, опублікована у вересні 2001
@uk
name
Multiple electron-beam lithography
@en
Multiple electron-beam lithography
@nl
type
label
Multiple electron-beam lithography
@en
Multiple electron-beam lithography
@nl
prefLabel
Multiple electron-beam lithography
@en
Multiple electron-beam lithography
@nl
P2093
P1476
Multiple electron-beam lithography
@en
P2093
Kim Y. Lee
Larry P. Muray
Marian Mankos
T.H.P. Chang
P304
P356
10.1016/S0167-9317(01)00528-7
P577
2001-09-01T00:00:00Z