(Ta1−xNbx)2O5 films produced by atomic layer deposition: Temperature dependent dielectric spectroscopy and room-temperature I–V characteristics
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(Ta1−xNbx)2O5 films produced by atomic layer deposition: Temperature dependent dielectric spectroscopy and room-temperature I–V characteristics
description
im November 2001 veröffentlichter wissenschaftlicher Artikel
@de
wetenschappelijk artikel
@nl
наукова стаття, опублікована в листопаді 2001
@uk
name
(Ta1−xNbx)2O5 films produced b ...... emperature I–V characteristics
@en
type
label
(Ta1−xNbx)2O5 films produced b ...... emperature I–V characteristics
@en
prefLabel
(Ta1−xNbx)2O5 films produced b ...... emperature I–V characteristics
@en
P2860
P50
P356
P1476
(Ta1−xNbx)2O5 films produced b ...... emperature I–V characteristics
@en
P2093
P2860
P304
P356
10.1063/1.1405837
P577
2001-11-01T00:00:00Z