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Q47105403-FABF20DD-B627-40BF-893B-8F4DA7E303B8
Q47105403-FABF20DD-B627-40BF-893B-8F4DA7E303B8
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http://www.wikidata.org/entity/statement/Q47105403-FABF20DD-B627-40BF-893B-8F4DA7E303B8
Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker.
P2860
Q47105403-FABF20DD-B627-40BF-893B-8F4DA7E303B8
BestRank
Statement
http://www.wikidata.org/entity/statement/Q47105403-FABF20DD-B627-40BF-893B-8F4DA7E303B8
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wasDerivedFrom
a0c113187ace72554271ea8bd568fe58e9e56c61
P2860
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.