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1
Q50901899-1DBC1243-0346-436A-B36D-8FEB54E2B4B7
Q50901899-1DBC1243-0346-436A-B36D-8FEB54E2B4B7
BestRank
Statement
http://www.wikidata.org/entity/statement/Q50901899-1DBC1243-0346-436A-B36D-8FEB54E2B4B7
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.
P2093
Q50901899-1DBC1243-0346-436A-B36D-8FEB54E2B4B7
BestRank
Statement
http://www.wikidata.org/entity/statement/Q50901899-1DBC1243-0346-436A-B36D-8FEB54E2B4B7
rank
NormalRank
type
BestRank
Statement
wasDerivedFrom
7c24e2e431e91082ddbe2e79cc7d1cc5a772afd6
P1545
2
http://www.w3.org/2001/XMLSchema#string
P2093
Huiman Kang
http://www.w3.org/2001/XMLSchema#string