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Q50901899-2CBE3003-C207-4AE6-A55C-A9AB52B22A56
Q50901899-2CBE3003-C207-4AE6-A55C-A9AB52B22A56
BestRank
Statement
http://www.wikidata.org/entity/statement/Q50901899-2CBE3003-C207-4AE6-A55C-A9AB52B22A56
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.
P304
Q50901899-2CBE3003-C207-4AE6-A55C-A9AB52B22A56
BestRank
Statement
http://www.wikidata.org/entity/statement/Q50901899-2CBE3003-C207-4AE6-A55C-A9AB52B22A56
rank
NormalRank
type
BestRank
Statement
wasDerivedFrom
7c24e2e431e91082ddbe2e79cc7d1cc5a772afd6
P304
168-175
http://www.w3.org/2001/XMLSchema#string