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1
Q50901899-9C6DC27F-C56B-4477-B8C9-45C71F4F20B5
Q50901899-9C6DC27F-C56B-4477-B8C9-45C71F4F20B5
BestRank
Statement
http://www.wikidata.org/entity/statement/Q50901899-9C6DC27F-C56B-4477-B8C9-45C71F4F20B5
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.
P2093
Q50901899-9C6DC27F-C56B-4477-B8C9-45C71F4F20B5
BestRank
Statement
http://www.wikidata.org/entity/statement/Q50901899-9C6DC27F-C56B-4477-B8C9-45C71F4F20B5
rank
NormalRank
type
BestRank
Statement
wasDerivedFrom
7c24e2e431e91082ddbe2e79cc7d1cc5a772afd6
P1545
8
http://www.w3.org/2001/XMLSchema#string
P2093
Paul F Nealey
http://www.w3.org/2001/XMLSchema#string