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Q50901899-9F812D2F-9503-4E6D-8D5E-CFBC7CD9F21E
Q50901899-9F812D2F-9503-4E6D-8D5E-CFBC7CD9F21E
BestRank
Statement
http://www.wikidata.org/entity/statement/Q50901899-9F812D2F-9503-4E6D-8D5E-CFBC7CD9F21E
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.
P698
Q50901899-9F812D2F-9503-4E6D-8D5E-CFBC7CD9F21E
BestRank
Statement
http://www.wikidata.org/entity/statement/Q50901899-9F812D2F-9503-4E6D-8D5E-CFBC7CD9F21E
rank
NormalRank
type
BestRank
Statement
wasDerivedFrom
7c24e2e431e91082ddbe2e79cc7d1cc5a772afd6
P698
19206647
http://www.w3.org/2001/XMLSchema#string