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Q53399964-9E2C06BF-0768-4F0A-A30C-BFD3042A8ED7
Q53399964-9E2C06BF-0768-4F0A-A30C-BFD3042A8ED7
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http://www.wikidata.org/entity/statement/Q53399964-9E2C06BF-0768-4F0A-A30C-BFD3042A8ED7
Defect removal in the course of directed self-assembly is facilitated in the vicinity of the order-disorder transition.
P2860
Q53399964-9E2C06BF-0768-4F0A-A30C-BFD3042A8ED7
BestRank
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http://www.wikidata.org/entity/statement/Q53399964-9E2C06BF-0768-4F0A-A30C-BFD3042A8ED7
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8d66bacdc0c5ab692ceb86bc05c02038a760ce7b
P2860
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.