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Q53658001-94F7FB3D-CA1E-4376-9C4D-7D3652D0AC5E
Q53658001-94F7FB3D-CA1E-4376-9C4D-7D3652D0AC5E
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http://www.wikidata.org/entity/statement/Q53658001-94F7FB3D-CA1E-4376-9C4D-7D3652D0AC5E
Kinetics of lamellar formation on sparsely stripped patterns.
P2860
Q53658001-94F7FB3D-CA1E-4376-9C4D-7D3652D0AC5E
BestRank
Statement
http://www.wikidata.org/entity/statement/Q53658001-94F7FB3D-CA1E-4376-9C4D-7D3652D0AC5E
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wasDerivedFrom
da4afc7d04dc6ffa4c4501905583bdd34ede96ce
P2860
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.