Advances in patterning materials for 193 nm immersion lithography.

Advances in patterning materials for 193 nm immersion lithography.

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http://www.wikidata.org/entity/Q45952230
No time to lose--high throughput screening to assess nanomaterial safetyHighly tunable refractive index visible-light metasurface from block copolymer self-assembly.Fabrication of transistors on flexible substrates: from mass-printing to high-resolution alternative lithography strategies.Drops on soft surfaces learn the hard way.Advancing X-ray scattering metrology using inverse genetic algorithms.Organized chromophoric assemblies for nonlinear optical materials: towards (sub)wavelength scale architectures.Patterning highly ordered arrays of complex nanofeatures through EUV directed polarity switching of non chemically amplified photoresist.Self-assembly of gradient copolymers synthesized in semi-batch mode by nitroxide mediated polymerization.A novel photodegradable hyperbranched polymeric photoresist.Monolithic, Crystalline MOF Coating: An Excellent Patterning and Photoresist Material
P2860

Advances in patterning materials for 193 nm immersion lithography.

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http://www.wikidata.org/entity/Q45952230
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2010 nî lūn-bûn
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2010年の論文
@ja
2010年学术文章
@wuu
2010年学术文章
@zh
2010年学术文章
@zh-cn
2010年学术文章
@zh-hans
2010年学术文章
@zh-my
2010年学术文章
@zh-sg
2010年學術文章
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2010年學術文章
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name
Advances in patterning materials for 193 nm immersion lithography.
@en
Advances in patterning materials for 193 nm immersion lithography.
@nl
type
label
Advances in patterning materials for 193 nm immersion lithography.
@en
Advances in patterning materials for 193 nm immersion lithography.
@nl
prefLabel
Advances in patterning materials for 193 nm immersion lithography.
@en
Advances in patterning materials for 193 nm immersion lithography.
@nl
P1433
P1476
P2093
P304
P31
P356
P433
P478
P577
P698
P356
P1433
P1476
Advances in patterning materials for 193 nm immersion lithography.
@en
P2093
P304
P31
P356
P433
P478
P577
P698