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Q47243574-BC1C4AF6-1FC5-464B-BDA5-DA23222AF3BD
Q47243574-BC1C4AF6-1FC5-464B-BDA5-DA23222AF3BD
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http://www.wikidata.org/entity/statement/Q47243574-BC1C4AF6-1FC5-464B-BDA5-DA23222AF3BD
Nanoscale electron beam induced etching: a continuum model that correlates the etch profile to the experimental parameters.
P1476
Q47243574-BC1C4AF6-1FC5-464B-BDA5-DA23222AF3BD
BestRank
Statement
http://www.wikidata.org/entity/statement/Q47243574-BC1C4AF6-1FC5-464B-BDA5-DA23222AF3BD
rank
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wasDerivedFrom
d5b9cf148efc8a5a0569d44315a9c149c147b406
P1476
Nanoscale electron beam induce
......
to the experimental parameters
@en