Nanoscale electron beam induced etching: a continuum model that correlates the etch profile to the experimental parameters.
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Continuum models of focused electron beam induced processingNanofabrication of insulated scanning probes for electromechanical imaging in liquid solutions.Synthesis and electroplating of high resolution insulated carbon nanotube scanning probes for imaging in liquid solutionsPrecision Milling of Carbon Nanotube Forests Using Low Pressure Scanning Electron Microscopy.Dynamic Pattern Formation in Electron-Beam-Induced Etching.
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Nanoscale electron beam induced etching: a continuum model that correlates the etch profile to the experimental parameters.
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2008 nî lūn-bûn
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2008年の論文
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2008年学术文章
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2008年学术文章
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2008年学术文章
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name
Nanoscale electron beam induce ...... o the experimental parameters.
@en
Nanoscale electron beam induce ...... o the experimental parameters.
@nl
type
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Nanoscale electron beam induce ...... o the experimental parameters.
@en
Nanoscale electron beam induce ...... o the experimental parameters.
@nl
prefLabel
Nanoscale electron beam induce ...... o the experimental parameters.
@en
Nanoscale electron beam induce ...... o the experimental parameters.
@nl
P356
P1433
P1476
Nanoscale electron beam induce ...... to the experimental parameters
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P2093
Matthew G Lassiter
P304
P356
10.1088/0957-4484/19/45/455306
P577
2008-10-08T00:00:00Z