Tuning PDMS brush chemistry by UV-O3 exposure for PS-b-PDMS microphase separation and directed self-assembly.
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Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application.Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer.Design and synthesis study of the thermo-sensitive poly (N-vinylpyrrolidone-b- N, N-diethylacrylamide).
P2860
Tuning PDMS brush chemistry by UV-O3 exposure for PS-b-PDMS microphase separation and directed self-assembly.
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2013 nî lūn-bûn
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Tuning PDMS brush chemistry by ...... on and directed self-assembly.
@en
Tuning PDMS brush chemistry by ...... on and directed self-assembly.
@nl
type
label
Tuning PDMS brush chemistry by ...... on and directed self-assembly.
@en
Tuning PDMS brush chemistry by ...... on and directed self-assembly.
@nl
prefLabel
Tuning PDMS brush chemistry by ...... on and directed self-assembly.
@en
Tuning PDMS brush chemistry by ...... on and directed self-assembly.
@nl
P2093
P356
P1433
P1476
Tuning PDMS brush chemistry by ...... on and directed self-assembly.
@en
P2093
Dipu Borah
Justin D Holmes
Michael A Morris
Ramsankar Senthamaraikannan
Sozaraj Rasappa
P304
P356
10.1021/LA401561K
P407
P577
2013-07-01T00:00:00Z