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Q38988062-CEBB28F3-A0AA-4B69-8091-0CE8D5A9FE22
Q38988062-CEBB28F3-A0AA-4B69-8091-0CE8D5A9FE22
BestRank
Statement
http://www.wikidata.org/entity/statement/Q38988062-CEBB28F3-A0AA-4B69-8091-0CE8D5A9FE22
The Integration of Sub-10 nm Gate Oxide on MoS2 with Ultra Low Leakage and Enhanced Mobility.
P2093
Q38988062-CEBB28F3-A0AA-4B69-8091-0CE8D5A9FE22
BestRank
Statement
http://www.wikidata.org/entity/statement/Q38988062-CEBB28F3-A0AA-4B69-8091-0CE8D5A9FE22
rank
NormalRank
type
BestRank
Statement
wasDerivedFrom
7f5b478c788d5696cc2b6cef8989e07390a59ab2
P1545
3
http://www.w3.org/2001/XMLSchema#string
P2093
Yang Geng
http://www.w3.org/2001/XMLSchema#string