A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation.
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Area Selective Polymer Brush Deposition.Oxide-Nanotrap-Anchored Platinum Nanoparticles with High Activity and Sintering Resistance by Area-Selective Atomic Layer Deposition.Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation.Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle.Conformal Nanocoatings with Uniform and Controllable Thickness on Microstructured Surfaces: A General Assembly Route.Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid.Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies.
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P2860
A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation.
description
2016 nî lūn-bûn
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2016年の論文
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2016年学术文章
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2016年学术文章
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2016年学术文章
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2016年学术文章
@zh-hans
2016年学术文章
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2016年学术文章
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2016年學術文章
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2016年學術文章
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name
A Process for Topographically ...... tructures by Ion Implantation.
@en
A Process for Topographically ...... tructures by Ion Implantation.
@nl
type
label
A Process for Topographically ...... tructures by Ion Implantation.
@en
A Process for Topographically ...... tructures by Ion Implantation.
@nl
prefLabel
A Process for Topographically ...... tructures by Ion Implantation.
@en
A Process for Topographically ...... tructures by Ion Implantation.
@nl
P2093
P50
P356
P1433
P1476
A Process for Topographically ...... tructures by Ion Implantation.
@en
P2093
Dara Bobb-Semple
Ludovic Godet
Stacey F Bent
Tobin Kaufman-Osborn
Woo-Hee Kim
Yeongin Kim
P304
P356
10.1021/ACSNANO.6B00094
P407
P577
2016-03-07T00:00:00Z