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A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation.Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition.Selective Deposition of Dielectrics: Limits and Advantages of Alkanethiol Blocking Agents on Metal-Dielectric Patterns.Thermal atomic layer deposition of gold nanoparticles: controlled growth and size selection for photocatalysis
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description
investigador
@es
researcher
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wetenschapper
@nl
name
Fatemeh Sadat Minaye Hashemi
@en
Fatemeh Sadat Minaye Hashemi
@nl
type
label
Fatemeh Sadat Minaye Hashemi
@en
Fatemeh Sadat Minaye Hashemi
@nl
prefLabel
Fatemeh Sadat Minaye Hashemi
@en
Fatemeh Sadat Minaye Hashemi
@nl
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P496
0000-0003-3516-3689