Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
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Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodesCrystallinity of inorganic films grown by atomic layer deposition: Overview and general trendsFluidization of nanopowders: a review.Stabilization of copper catalysts for liquid-phase reactions by atomic layer deposition.Low-temperature atomic layer deposition delivers more active and stable Pt-based catalysts.PEALD-Grown Crystalline AlN Films on Si (100) with Sharp Interface and Good Uniformity.Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and depositionSynthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity.A combined scanning tunneling microscope-atomic layer deposition tool.The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition.Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications.Thin film encapsulation for organic light-emitting diodes using inorganic/organic hybrid layers by atomic layer deposition.Direct electron injection into an oxide insulator using a cathode buffer layerUltralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs.Atomic layer deposition (ALD): A versatile technique for plasmonics and nanobiotechnologyThickness scaling of atomic-layer-deposited HfO2 films and their application to wafer-scale graphene tunnelling transistorsQuantitative Analysis of Single and Mix Food Antiseptics Basing on SERS Spectra with PLSR MethodThe Influence of Hafnium Doping on Density of States in Zinc Oxide Thin-Film Transistors Deposited via Atomic Layer Deposition.Tailoring nanoporous materials by atomic layer deposition.Nanoengineering and interfacial engineering of photovoltaics by atomic layer deposition.Atomic layer deposition of nanostructured materials for energy and environmental applications.A review of carbon nanotube- and graphene-based flexible thin-film transistors.Precision synthesis of colloidal inorganic nanocrystals using metal and metalloid amides.Controllable fabrication of nanostructured materials for photoelectrochemical water splitting via atomic layer deposition.Ag Nanorods-Oxide Hybrid Array Substrates: Synthesis, Characterization, and Applications in Surface-Enhanced Raman Scattering.Atomic Layer Deposition of Silicon Nitride Thin Films: A Review of Recent Progress, Challenges, and Outlooks.Classification of processes for the atomic layer deposition of metals based on mechanistic information from density functional theory calculations.Atomic and molecular layer deposition: off the beaten track.Catalyst support effects on hydrogen spillover.Characterization of High-k Nanolayers by Grazing Incidence X-ray SpectrometryEmerging Applications for High K Materials in VLSI Technology.Germanium Based Field-Effect Transistors: Challenges and Opportunities.Fluidized bed coupled rotary reactor for nanoparticles coating via atomic layer deposition.Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions.Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition.Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System.Fluidized-bed atomic layer deposition reactor for the synthesis of core-shell nanoparticles.Rapid atomic layer deposition of silica nanolaminates: synergistic catalysis of Lewis/Brønsted acid sites and interfacial interactions.ALD/MLD of novel layer-engineered Zn-based inorganic-organic hybrid thin films using heterobifunctional 4-aminophenol as an organic precursor.Atomic imaging of nucleation of trimethylaluminum on clean and H2O functionalized Ge(100) surfaces.
P2860
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P2860
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
description
2005 nî lūn-bûn
@nan
2005 թուականի Յունիսին հրատարակուած գիտական յօդուած
@hyw
2005 թվականի հունիսին հրատարակված գիտական հոդված
@hy
2005年の論文
@ja
2005年論文
@yue
2005年論文
@zh-hant
2005年論文
@zh-hk
2005年論文
@zh-mo
2005年論文
@zh-tw
2005年论文
@wuu
name
Surface chemistry of atomic la ...... rimethylaluminum/water process
@ast
Surface chemistry of atomic la ...... rimethylaluminum/water process
@en
type
label
Surface chemistry of atomic la ...... rimethylaluminum/water process
@ast
Surface chemistry of atomic la ...... rimethylaluminum/water process
@en
prefLabel
Surface chemistry of atomic la ...... rimethylaluminum/water process
@ast
Surface chemistry of atomic la ...... rimethylaluminum/water process
@en
P3181
P356
P1476
Surface chemistry of atomic la ...... rimethylaluminum/water process
@en
P2093
Riikka L. Puurunen
P2860
P304
P3181
P356
10.1063/1.1940727
P577
2005-06-15T00:00:00Z