Negative-tone block copolymer lithography by in situ surface chemical modification.
about
Negative-tone block copolymer lithography by in situ surface chemical modification.
description
2014 nî lūn-bûn
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2014年の論文
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2014年学术文章
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2014年学术文章
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2014年学术文章
@zh-cn
2014年学术文章
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2014年学术文章
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2014年学术文章
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2014年學術文章
@zh-hant
name
Negative-tone block copolymer lithography by in situ surface chemical modification.
@en
Negative-tone block copolymer lithography by in situ surface chemical modification.
@nl
type
label
Negative-tone block copolymer lithography by in situ surface chemical modification.
@en
Negative-tone block copolymer lithography by in situ surface chemical modification.
@nl
prefLabel
Negative-tone block copolymer lithography by in situ surface chemical modification.
@en
Negative-tone block copolymer lithography by in situ surface chemical modification.
@nl
P2093
P2860
P356
P1433
P1476
Negative-tone block copolymer lithography by in situ surface chemical modification
@en
P2093
Bong Hoon Kim
Jinseung Kim
Jonghwa Shin
Joong-Yeon Cho
Ju Young Kim
Kyeong-Jae Byeon
Sang Ouk Kim
Seong-Jun Jeong
P2860
P304
P356
10.1002/SMLL.201400971
P577
2014-06-10T00:00:00Z