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Q53529991-BEEDE289-62A1-4053-8ACD-3522CF4D9A47
Q53529991-BEEDE289-62A1-4053-8ACD-3522CF4D9A47
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http://www.wikidata.org/entity/statement/Q53529991-BEEDE289-62A1-4053-8ACD-3522CF4D9A47
Negative-tone block copolymer lithography by in situ surface chemical modification.
P2860
Q53529991-BEEDE289-62A1-4053-8ACD-3522CF4D9A47
BestRank
Statement
http://www.wikidata.org/entity/statement/Q53529991-BEEDE289-62A1-4053-8ACD-3522CF4D9A47
rank
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wasDerivedFrom
a132248b499e5f012cf6cd8e4a12bdc3aed4f7d5
P2860
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.