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Q49957403-910F4ADF-18D1-43E2-85A6-C970876BE9C5
Q49957403-910F4ADF-18D1-43E2-85A6-C970876BE9C5
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http://www.wikidata.org/entity/statement/Q49957403-910F4ADF-18D1-43E2-85A6-C970876BE9C5
Influence of topographically patterned angled guidelines on directed self-assembly of block copolymers.
P2860
Q49957403-910F4ADF-18D1-43E2-85A6-C970876BE9C5
BestRank
Statement
http://www.wikidata.org/entity/statement/Q49957403-910F4ADF-18D1-43E2-85A6-C970876BE9C5
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wasDerivedFrom
d74e9fb1e5c7d06cc4e79c64491345264510aaa1
P2860
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.