Ferroelectricity and antiferroelectricity of doped thin HfO2-based films.
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Enhancement of the blue photoluminescence intensity for the porous silicon with HfO2 filling into microcavities.Fatigue mechanism of yttrium-doped hafnium oxide ferroelectric thin films fabricated by pulsed laser deposition.The demonstration of significant ferroelectricity in epitaxial Y-doped HfO2 filmGiant Negative Electrocaloric Effects of Hf0.5 Zr0.5 O2 Thin Films.Two-step polarization switching mediated by a nonpolar intermediate phase in Hf0.4Zr0.6O2 thin films.A study on the wake-up effect of ferroelectric Hf0.5Zr0.5O2 films by pulse-switching measurement.Giant tunnelling electroresistance in metal/ferroelectric/semiconductor tunnel junctions by engineering the Schottky barrier.Understanding the formation of the metastable ferroelectric phase in hafnia-zirconia solid solution thin films.Direct Probing of Polarization Charge at Nanoscale Level.Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment.Investigation on the structures and magnetic properties of carbon or nitrogen doped cobalt ferrite nanoparticles.Strong polarization switching with low-energy loss in hydrogen-bonded organic antiferroelectrics.Si Doped Hafnium Oxide-A “Fragile” Ferroelectric SystemA comprehensive study on the structural evolution of HfO2 thin films doped with various dopantsScaling Effects in Perovskite Ferroelectrics: Fundamental Limits and Process-Structure-Property Relations
P2860
Q36211554-AA11C379-E868-45E3-BE0F-1510009F1EABQ36214637-C1B03473-538D-451F-815C-7EB45C6CBEC7Q37243614-3424E1C4-C5E0-4F4D-BF8B-8B289484829CQ38412983-6D8BDEC5-18B5-4D7B-A719-C22CA59226E7Q38418646-30F659F7-386A-44F7-8EA7-7E982FB04CE9Q38421029-B914B653-FF3B-483C-9F90-48EC64444E67Q42108275-F93A5E8B-D908-451F-8763-D6B79A2D19FFQ47247917-C304505D-24FD-48CD-A917-B7C225AAD8E9Q47351479-794250E1-D28F-44D7-BF4D-3B9820541E4AQ47954236-DCE92DBC-722B-40AD-B04F-F416194D4B03Q55040188-5749D44E-4DC6-45ED-8A18-40BC37E6DDACQ55386195-2F79AC38-199C-4747-A588-7B2942833696Q57424304-16F203ED-5620-4087-B53B-D4A13B5A4D9FQ57426255-0D7A1B23-DA9B-4DF1-9D5B-B421B4B46E7CQ57430998-50241EBE-FB38-49A6-A030-6A97ECF95A0B
P2860
Ferroelectricity and antiferroelectricity of doped thin HfO2-based films.
description
2015 nî lūn-bûn
@nan
2015年の論文
@ja
2015年論文
@yue
2015年論文
@zh-hant
2015年論文
@zh-hk
2015年論文
@zh-mo
2015年論文
@zh-tw
2015年论文
@wuu
2015年论文
@zh
2015年论文
@zh-cn
name
Ferroelectricity and antiferroelectricity of doped thin HfO2-based films.
@en
type
label
Ferroelectricity and antiferroelectricity of doped thin HfO2-based films.
@en
prefLabel
Ferroelectricity and antiferroelectricity of doped thin HfO2-based films.
@en
P2093
P2860
P356
P1433
P1476
Ferroelectricity and antiferroelectricity of doped thin HfO2-based films.
@en
P2093
Alfred Kersch
Cheol Seong Hwang
Han Joon Kim
Johannes Müller
Keum Do Kim
Taehwan Moon
Uwe Schroeder
Young Hwan Lee
Yu Jin Kim
P2860
P304
P356
10.1002/ADMA.201404531
P407
P577
2015-02-11T00:00:00Z