Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography.

about

Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography.

Item

http://www.wikidata.org/entity/Q47097277

description

2017 nî lūn-bûn

@nan

2017年の論文

@ja

2017年学术文章

@wuu

2017年学术文章

@zh

2017年学术文章

@zh-cn

2017年学术文章

@zh-hans

2017年学术文章

@zh-my

2017年学术文章

@zh-sg

2017年學術文章

@yue

2017年學術文章

@zh-hant

name

Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography.

@en

Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography.

@nl

type

Item

label

Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography.

@en

Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography.

@nl

prefLabel

Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography.

@en

Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography.

@nl

P1476

Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography.

@en

P2093

Michael A Morris

http://www.w3.org/2001/XMLSchema#string

P2860

Soft templating strategies for the synthesis of mesoporous materials: inorganic, organic-inorganic hybrid and purely organic solids.

Directed self-assembly of block copolymers: a tutorial review of strategies for enabling nanotechnology with soft matter.

Well-ordered nanohybrids and nanoporous materials from gyroid block copolymer templates.

Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application.

Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer.

Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly.

Pattern transfer using block copolymers.

Fabrication of ordered, large scale, horizontally-aligned si nanowire arrays based on an in situ hard mask block copolymer approach.

Multicomponent nanopatterns by directed block copolymer self-assembly.

Performance Enhancement of Electronic and Energy Devices via Block Copolymer Self-Assembly.

P31

scholarly article

P356

10.3390/NANO7100304

http://www.w3.org/2001/XMLSchema#string

P433

http://www.w3.org/2001/XMLSchema#string

P478

http://www.w3.org/2001/XMLSchema#string

P50

Alan P. Bell

Cian Cummins

P577

2017-09-30T00:00:00Z

http://www.w3.org/2001/XMLSchema#dateTime

P698

28973987

http://www.w3.org/2001/XMLSchema#string

P932

5666469

http://www.w3.org/2001/XMLSchema#string