Ozone-Based Atomic Layer Deposition of Alumina from TMA: Growth, Morphology, and Reaction Mechanism
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Tailoring nanoporous materials by atomic layer deposition.Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition.Phonon response in the infrared region to thickness of oxide films formed by atomic layer deposition.Surface chemistry of copper metal and copper oxide atomic layer deposition from copper(ii) acetylacetonate: a combined first-principles and reactive molecular dynamics study.Atomistic kinetic Monte Carlo study of atomic layer deposition derived from density functional theory.O3-based atomic layer deposition of hexagonal La2O3 films on Si(100) and Ge(100) substratesAtomic Layer Deposition of NiO Films on Si(100) Using Cyclopentadienyl-Type Compounds and Ozone as PrecursorsBlistering mechanisms of atomic-layer-deposited AlN and Al2O3 filmsOzone-Based Atomic Layer Deposition of Al2 O3 from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation
P2860
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P2860
Ozone-Based Atomic Layer Deposition of Alumina from TMA: Growth, Morphology, and Reaction Mechanism
description
article
@en
im August 2006 veröffentlichter wissenschaftlicher Artikel
@de
wetenschappelijk artikel
@nl
наукова стаття, опублікована в серпні 2006
@uk
name
Ozone-Based Atomic Layer Depos ...... hology, and Reaction Mechanism
@en
Ozone-Based Atomic Layer Depos ...... hology, and Reaction Mechanism
@nl
type
label
Ozone-Based Atomic Layer Depos ...... hology, and Reaction Mechanism
@en
Ozone-Based Atomic Layer Depos ...... hology, and Reaction Mechanism
@nl
prefLabel
Ozone-Based Atomic Layer Depos ...... hology, and Reaction Mechanism
@en
Ozone-Based Atomic Layer Depos ...... hology, and Reaction Mechanism
@nl
P2093
P356
P1476
Ozone-Based Atomic Layer Depos ...... hology, and Reaction Mechanism
@en
P2093
M. Fanciulli
S. D. Elliott
P304
P356
10.1021/CM0608903
P577
2006-08-01T00:00:00Z